The quartz tube furnace processes wafers up to 8 inch rounds for diffusion, passivation and annealing.
The tool is a 3-stack furnace. Each of the tubes in the furnace is 300 mm in diameter and is heated using a three-zone methodology. The three tubes are presently configured for
- Oxidation and boron drive-in
- Phosphorous diffusion using POCl3
- Hydrogen annealing
Currently, the tool is primarily used for processing on 4 inch round, 6 inch round and 6 inch square substrates. However, wafer carriers exist for a variety of substrate sizes ranging from 6 inch square down to pieces.